論文 |
No. | 論文タイトル, 著者, 誌名(出版物名), 巻( 号), 開始ページ- 終了ページ, 出版年月(日), DOI, URL
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2 | Si (100) and (110) etching properties in 5, 15, 30 and 48 wt% KOH aqueous solution containing Triton-X-100, H. Tanaka, M. Takeda, K. Sato, Microsystem Technologies, 23( 12), 5343- 5350, 2017年, 10.1007/s00542-017-3368-y,
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3 | MEMS製作のためのエッチング加工の動向(シリコンを例として), 田中浩,金尾寛人, 表面技術, ( 7), , 2017年, ,
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4 | Fabrication of curved sub-micron Si structures by a combination of anisotropic etching using surfactant-added TMAH solution and FIB direct-drawn mask, H. Tanaka, H. Hida and K. Sato, Microsystem Technologies, 19, 1065- 1067, 2013年, 10.1007/s00542-012-1700-0,
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5 | 電界砥粒制御技術を用いた研磨に よるスローアウェイ工具の長寿命化検討, 田中浩,藤谷恭輔, 谷口智洋, 川瀬惠嗣,赤上陽一, 表面技術, 63, 456- , 2012年, ,
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6 | Effect of magnesium in KOH solution on the anisotropic wet etching of silicon, H. Tanaka, D. Cheng, M. Shikida, and K. Sato, Sensors and Actuators, A134-2, 465- , 2007年, ,
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7 | Characterization of anisotropic etching properties of single crystal silicon: Effects of ppb-level of Cu and Pb in KOH solution, H. Tanaka, D. Cheng, M. Shikida and K. Sato, Sensors and Actuators, A128-1, 125- , 2006年, ,
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8 | Fast etching of silicon with a smooth surface in high temperature ranges near the boiling point of KOH solution, H. Tanaka, S. Yamashita, Y. Abe, M. Shikida, and K. Sato, Sensors and Actuators A, 114, 526- , 2004年, ,
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9 | Effects of ppb-level metal impurities in aqueous potassium hydroxide solution on the etching of Si{110} and {100}, H. Tanaka, Y. Abe, K. Inoue, M. Shikida, and K. Sato, Sensors and Materials, 15, 43- , 2003年, ,
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10 | Effects of small amount of impurities on etching of silicon in aqueous potassium hydroxide solution, H. Tanaka, Y. Abe, T. Yoneyama, J. Ishikawa, O. Takenaka and K. Inoue, Sensors and Actuators A, 82, 270- , 2000年, ,
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11 | KOH水溶液によるSi{110} エッチング特性への微量Cuの影響, 田中浩、井上和之、阿部吉次、米山孝夫、石川順次、竹中修, 電気学会論文誌E, 118-E, 272- , 1998年, ,
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講演・口頭発表等 |
No. | 講演・口頭発表タイトル, 講演者, 会議名, 開催地, 発表年月日, 主催者,
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1 | Novel polishing method of cutting edge using AC electric field for controlling Flank wear, H. Tanaka, Y. Kawase and Y. Akagami, The 8th International Conference on Tribology in Manufacturing Processes (ICTMP2018), Elsinore, 2018年06月, ,
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2 | Suppress the generation of micro pyramid on Si (100) surface etched in 1wt%KOH solution using air bubbling, 田中浩, Y. Saito and H. Tanaka, Kanazawa, 2016年06月, ,
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3 | Development of high speed and precise Si anisotropic wet etching technology in mass production for automotive sensor, 田中浩, Five Days TEQIP Workshop cum Certificate Course on MEMS & NEMS (Design and Fabrication) , Hyderabad, 2015年12月, ,
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4 | A Perfect adsorption of ppb-level surfactant in 5 wt% KOH water solution on a silicon surface changing anisotropic etching properties, H. Tanaka, N. Umeki, and K. Sato, 17th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers 2013), Barcelona, 2013年06月, ,
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5 | Effect of impurities on the anisotropic etching of Si {110} and {100}, H. Tanaka, 1st International Workshop on Progress in Anisotropic Wet Chemical Etching (PiAWCE), Levi, 2006年12月, ,
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6 | Effect of magnesium in KOH solution on the anisotropic wet etching of silicon, H. Tanaka, D. Cheng, K. Inoue, M. Shikida, K. Sato, 2004 International symposium on Micro-Nano Mechatronics and Human Science (MHS 2004), Nagoya, 2004年11月, ,
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7 | Characterization of anisotropic etching properties of single crystal silicon: Effects of ppb-level of Cu and Pb in KOH solution, H. Tanaka, D. Cheng, M. Shikida and K. Sato, 4th Workshop on Physical Chemistry of Wet Etching of Silicon (PCWES 2004), Montreal, 2004年05月, ,
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8 | Fast wet anisotropic etching of Si {100} and {110} with a smooth surface in ultra-high temperature KOH solutions, 田中浩, 3rd Workshop on Physical Chemistry of Wet Etching of Silicon (PCWES 2002), Nara, 2002年06月, ,
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9 | Effects of small amount of impurities on etching of silicon in aqueous potassium hydroxide solutions, H. Tanaka, K. Inoue, Y. Abe, T. Yoneyama, J. Ishikawa and O. Takenaka, 10 th International Conference on Solid-State Sensors and Actuators (Transducers 99), Sendai, 1999年, ,
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